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Progress in SiC MOSFET Reliability

机译:SiC MOSFET可靠性研究进展

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摘要

Bias-temperature stress experiments performed on two generations of SiC power MOSFETs from the same manufacturer show reductions in threshold voltage (V_T) shift at elevated temperatures from first- to second-generation. The negative V_T shift is reduced from a range of-1 V to -1.6 V to a range of-100 mV to -300 mV for temperatures from 125℃ to 175℃. Plastic-packaged parts show a gate-bias-independent junction leakage current at temperatures above the rated temperature, suggesting that the plastic packaging introduces an extrinsic leakage path. Junction leakage in metal-packaged parts can be significantly reduced by applying a small negative gate bias at elevated temperatures. Switching gate bias temperature stresses show V_T shifts dependent on duty cycle, with a higher duty cycle resulting in a higher rate of V_T shift. Cumulative damage effects may be observed between switching gate bias stresses.
机译:在同一生产商的两代SiC功率MOSFET上进行的偏压温度应力实验表明,从第一代到第二代,在升高的温度下,阈值电压(V_T)的偏移减小了。对于125℃至175℃的温度,负V_T偏移从-1 V至-1.6 V的范围减小至100 mV至-300 mV的范围。在高于额定温度的温度下,塑料封装部件显示出与栅极偏置无关的结泄漏电流,这表明塑料封装引入了外部泄漏路径。通过在升高的温度下施加较小的负栅极偏置,可以大大减少金属封装零件中的结泄漏。开关栅极偏置温度应力显示V_T移位取决于占空比,较高的占空比导致较高的V_T移位速率。在开关栅极偏置应力之间可能会观察到累积的损坏效应。

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  • 来源
  • 会议地点 San Francisco CA(US)
  • 作者单位

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

    Sandia National Laboratories, PO Box 5800, MS 1084, Albuquerque, NM 87185-1084;

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  • 正文语种 eng
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