首页> 外文会议>Gallium Nitride Materials and Devices >Review of Recent Efforts on the Growth and Characterization of Nitride-based Diluted Magnetic Semiconductors
【24h】

Review of Recent Efforts on the Growth and Characterization of Nitride-based Diluted Magnetic Semiconductors

机译:基于氮化物的稀磁半导体生长和表征的最新研究进展

获取原文
获取原文并翻译 | 示例

摘要

Wide bandgap nitrides and oxides have been heralded as a possible platform for future semiconductor spintronics applications based on the inherent compatibility of these materials with existing semiconductors as well as theoretical predictions of room temperature ferromagnetism. Experimental reports of room temperature ferromagnetism in these materials are complicated by disparate crystalline quality and phase purity in these materials, as well as conflicting theoretical predictions as to the nature of ferromagnetic behavior in this system. A complete understanding of these materials, and ultimately intelligent design of spintronic devices, will require an exploration of the relationship between the processing techniques, resulting transition metal atom configuration, defects, and electronic compensation as related to the structure, magnetic, and magneto-optical properties of this material. This work explores the growth and properties of Ga_(1-x)Mn_xN films by metalorganic chemical vapor deposition on c-plane sapphire substrates with varying thickness, Mn concentration, and alloying elements. Homogenous Mn incorporation throughout the films was verified with Secondary Ion Mass Spectroscopy (SIMS), and no macroscopic second phases were detected using X-ray diffraction (XRD). SQUID and vibrating sample magnetometry measurements showed an apparent room temperature ferromagnetic hysteresis, whose strength can be altered considerably through annealing and introduction of either Si or Mg during the growth process. Three sets of Raman modes appeared to be sensitive to Mn incorporation. The intensities of a broad band around 300cm~(-1) and sharper modes near 669cm~(-1) increased with increasing Mn concentration. The rise of the former is attributed to a decrease in long-range lattice ordering for higher Mn concentration. The second mode is due to nitrogen vacancy-related local vibrational modes of the GaN host lattice. Si co-doped Ga_(1-x)Mn_xN results in shallow donor states in GaN suppress the formation of nitrogen vacancies by compensating the p-tupe deep level defects introduced by substitutional Mn. The formation of a Mn-related midgap impurity band is observed via optical transmission measurement in Ga_(1-x)Mn)xN with strong magnetic signatures, but not for Si co-doped samples. Initial studies on light emitting diodes (LEDs) containing a Mn-doped active region have also been produced. Devices were fabricated with different Mn-doped active layer thicknesses, and Ⅰ-Ⅴ characteristics show that the devices become highly resistive as thickness of the Mn-doped active layer increases. The electroluminescence of these devices is dominated by a high suppressed band-edge recombination and a midgap defect-related emission, leading to an orange-colored but weakly emitting LED. These results suggest that traditional theoretical and device approaches akin to those realized in Ga_(1-x)Mn_xAs may be difficult to realize in Ga_(1-x)Mn_xN, and exploitation of these materials will require further novel device approaches taking into account the nature of this material.
机译:基于这些材料与现有半导体的固有兼容性以及室温铁磁性的理论预测,宽带隙氮化物和氧化物已被预示为未来半导体自旋电子学应用的可能平台。这些材料中的室温铁磁性的实验报告由于这些材料中不同的晶体质量和相纯度以及有关该系统中铁磁行为性质的理论预测相互矛盾而变得复杂。对这些材料的全面理解,以及对自旋电子器件的最终智能化设计,将需要探索处理技术之间的关系,所产生的过渡金属原子构型,缺陷和与结构,磁性和磁光有关的电子补偿。这种材料的特性。这项工作探索通过在厚度,锰浓度和合金元素不同的c面蓝宝石衬底上进行金属有机化学气相沉积而形成的Ga_(1-x)Mn_xN薄膜的生长和特性。通过二次离子质谱(SIMS)验证了整个薄膜中均质的Mn掺入,并且使用X射线衍射(XRD)未检测到宏观的第二相。 SQUID和振动样品的磁力测量显示出明显的室温铁磁滞,其强度可以通过退火以及在生长过程中引入Si或Mg来显着改变。三组拉曼模式似乎对锰的掺入敏感。随着Mn浓度的增加,在300cm〜(-1)附近的宽带强度和在669cm〜(-1)附近的尖峰模式强度增加。前者的增加归因于较高Mn浓度的长程晶格排列减少。第二种模式归因于GaN主晶格的氮空位相关的局部振动模式。 Si共掺杂的Ga_(1-x)Mn_xN导致GaN中的浅施主态通过补偿替代Mn引起的p型深层缺陷来抑制氮空位的形成。通过具有强磁性特征的Ga_(1-x)Mn)xN中的光学透射测量,观察到了Mn相关的中间能带杂质带的形成,但是对于Si共掺杂的样品却没有。还已经对包含锰掺杂的有源区的发光二极管(LED)进行了初步研究。制备了具有不同的Mn掺杂有源层厚度的器件,并且Ⅰ-Ⅴ特性表明,随着Mn掺杂有源层厚度的增加,器件变得具有高电阻性。这些器件的电致发光主要由高度抑制的带边重组和与中间能隙缺陷相关的发射所主导,从而产生橙色但发射较弱的LED。这些结果表明,类似于在Ga_(1-x)Mn_xA中实现的传统理论和器件方法可能难以在Ga_(1-x)Mn_xN中实现,并且利用这些材料将需要进一步的新颖器件方法,并考虑到这种材料的性质。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号