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Mg-hydrogen interaction in AlGaN alloys

机译:AlGaN合金中的Mg氢相互作用

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摘要

It is well known that hydrogen passivation of Mg in Mg-doped GaN reduces free hole concentrations. While there are numerous studies of passivation of Mg in GaN, little work has been reported concerning passivation rates in AlGaN alloys. We investigated the hydrogen interaction with Mg in nitrides by measuring the intensity of the electron paramagnetic resonance (EPR) signal associated with the acceptor. The samples were isothermally annealed in sequential steps ranging from 5 min - 6.6 h between 300 and 700 ℃ in H_2:N_2 (7%: 92%) or pure N_2. The signal intensity decreased during the H_2N_2 anneal and was revived by the N_2 anneal as expected; however, the rate at which the intensity changed was shown to depend on Al concentration. In addition, while all signals were quenched at 700 ℃ in H_2:N_2, a 750 ℃ N_2 anneal reactivated only about 30% of the Mg in the alloys and 80% of the intensity in the GaN film. These data suggest that the rate of passivation and activation of Mg by hydrogen is dependent on the concentration of Al in the Al_xGa_(1-x)N layer. The EPR annealing data could prove to be beneficial in improving p-type optimization in AlGaN alloys.
机译:众所周知,Mg掺杂的GaN中Mg的氢钝化会降低自由空穴浓度。尽管有许多关于GaN中Mg钝化的研究,但关于AlGaN合金中钝化率的报道很少。我们通过测量与受体相关的电子顺磁共振(EPR)信号的强度,研究了氮化物中Mg与氢的相互作用。将样品在H_2:N_2(7%:92%)或纯N_2中在300到700℃之间的5分钟至6.6小时的连续步骤中进行等温退火。在H_2N_2退火期间,信号强度降低,并通过N_2退火恢复了预期的信号强度;但是,强度变化的速度取决于Al的浓度。另外,虽然所有信号在H_2:N_2中在700℃淬灭,但750℃N_2退火仅使合金中Mg的约30%和GaN膜中的强度的80%重新活化。这些数据表明,氢对Mg的钝化和活化速率取决于Al_xGa_(1-x)N层中Al的浓度。 EPR退火数据可能被证明有助于改善AlGaN合金中的p型优化。

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  • 来源
    《Gallium nitride materials and devices VII》|2012年|p.82620L.1-82620L.6|共6页
  • 会议地点 San Francisco CA(US)
  • 作者单位

    University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;

    University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;

    University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;

    University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

    nitride semiconductors; mg dopant; hydrogen; magnetic resonance;

    机译:氮化物半导体毫克掺杂剂;氢;磁共振;

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