University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;
University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;
University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;
University of Alabama at Birmingham, Dept. of Physics, Birmingham, AL A. A. Allerman, Sandia National Laboratory, Albuquerque, NM;
nitride semiconductors; mg dopant; hydrogen; magnetic resonance;
机译:240–350–nm发射的纳米线中的AlGaN截面和AlGaN / AlN纳米盘中的合金不均匀性和载流子局部
机译:具有240-350 nm发射的纳米线中的AlGaN截面和AlGaN / AlN纳米盘中的合金不均匀性和载流子定位
机译:AlGaN / GaN高电子迁移率晶体管中的纳米级电热相互作用
机译:AlGaN合金中的声子模式与Algan / GaN MQW中间层
机译:基于AlGaN合金的紫外线电吸收调制器和发光二极管的开发
机译:(AlN)m /(GaN)n超晶格中MgGaδ掺杂降低高Al含量AlGaN合金中Mg活化能的实验证据
机译:具有240-350 nm发射的纳米线中的AlGaN截面和AlGaN / AlN纳米盘中的合金不均匀性和载流子定位