SURFACE ANALYSIS of Al FILM PREPARED FROM DIMETHYL-ALUMINUM-HYDRIDE

摘要

This work provides an experimental evidence for the validity of the elementary reaction model of dimethyl-aluminum-hydride (DMAH) on aluminum surface which the authors developed using quantum chemical calculations. Surface adsorbates on aluminum film was analyzed with in situ infrared reflection absorption spectroscopy (IR-RAS) during chemical vapor deposition (CVD). Peaks of -CH_3 and C-A1-C structures were observed, which is in accordance with the reaction model. The absence of Al-H peak also supported the model. In order to examine the model validity quantitatively, we observed the dependence of absorbance peak area on DMAH pressure and surface temperature. Considering insufficient signal to noise ratio of IR-RAS spectra, this dependence were roughly in agreement with the corresponding results of elementary reaction simulations based on the reaction model.