Abstract: Basic regimes of the KrF-laser-assisted patterning of a-C:H and of W-alloyed a-C/Si/O:H diamond-like films (DLF) of dielectrical and metal-like varieties are studied. Laser-induced processes of the film graphitization and ablation under the multipulsed irradiation are considered. The submicron resolution of the film structurization is shown to be possible by using the ablative projection UV laser lithography.!
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机译：摘要：研究了介电和类金属变种的KrF激光辅助构图的a-C：H和W合金a-C / Si / O：H金刚石样膜（DLF）的基本模式。考虑了多脉冲辐照下激光诱导的薄膜石墨化和烧蚀过程。通过使用烧蚀投影紫外激光光刻，显示出膜结构化的亚微米分辨率是可能的。
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