Abstract: A clean, high-power Extreme Ultraviolet (EUV) light source is being developed for Extreme Ultraviolet Lithography (EUVL). The source is based on a continuous jet of condensable gas irradiated with a diode-pumped solid state laser producing a time-averaged output power of 1700 W at 5000 - 6000 Hz. An illumination system is being assembled to collect and deliver the EUV output from the source and deliver it to a reticle and projection optics box to achieve an EUV exposure rate equivalent to ten 300-mm wafers per hour. !10
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