首页> 外文会议>European Microelectronics and Packaging Conference amp; Exhibition; 20070617-20; Oulu(FI) >Interface Reactions during Au-Ball/Wedge and AlSi1- Wedge/Wedge Bonding at room temperature
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Interface Reactions during Au-Ball/Wedge and AlSi1- Wedge/Wedge Bonding at room temperature

机译:室温下Au-Ball / Wedge和AlSi1-Wedge / Wedge键合期间的界面反应

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The presentation addresses results of Au Ball/Wedge Bonding and AlSi1 Wedge/Wedge Bonding from 125 ℃ down to room temperature (RT). In this context, also interfacial reactions on Flash-Au PCB-metallizations as well as microstructural changes in AlSi1 wire material in relationship to bonding conditions will be discussed. This emphasizes the understanding of bonding process remarkable. One topic is the verification of RT bondability of different types of Au wire on specific Al pad metallizations and PCB-substrates with Cu/Ni/Pd/Flash-Au metallization [1]. Investigations include mechanical tests of Au loops and ball contacts as well as microstructural observations of the contacts (FIB, SEM, TEM). A most important result in this context is, that Au/Al intermetallic phases with thicknesses of a few hundred nanometers were found below the Au contacts on Al metallization directly after bonding at room temperature. Secondly new results of the Au-Au interface between wire and Flash-Au finish metallization will be presented. Another related purpose was to investigate wedge microstructures of AlSil wire bonds as well as the interface between the bonding wire and a Cu/Ni/Flash-Au metallization layer. Focused Ion Beam (FIB) and Transmission Electron Microscopy (TEM) have been the dominant analytic methods. The interface between the AlSil wire and the Cu/Ni/Flash-Au metallization layer of the optimized bonds consists of a closed crystalline Au layer with a thickness of nearly 80 nm. Above this Au layer, a second smaller zone consisting of an intermetallic phase was analyzed and identified by electron diffraction as Au_8Al_3. Further a correlation of wire material structure changes (fiber texture to recrystallized grains) and ultrasonic power during bonding were determined. With this results understanding of room temperature wire bonding could be improved exceedingly.
机译:该演讲介绍了Au球/楔形键合和AlSi1楔形/楔形键合从125℃降至室温(RT)的结果。在这种情况下,还将讨论Flash-Au PCB金属化上的界面反应以及AlSi1线材中的微结构变化与键合条件的关系。这强调了对粘合过程的理解。一个主题是通过Cu / Ni / Pd / Flash-Au金属化[1]验证不同类型的Au线在特定的Al焊盘金属化和PCB基板上的RT键合能力。研究包括金环和球形触点的机械测试,以及触点的微观结构观察(FIB,SEM,TEM)。在此情况下,最重要的结果是,在室温下直接粘合后,在铝金属化的金触点下方发现了厚度为几百纳米的金/铝金属间相。其次,将介绍导线和Flash-Au精加工金属之间的Au-Au界面的新结果。另一个相关的目的是研究AlSil焊线的楔形微观结构以及焊线与Cu / Ni / Flash-Au金属化层之间的界面。聚焦离子束(FIB)和透射电子显微镜(TEM)是主要的分析方法。 AlSil焊丝和优化键合的Cu / Ni / Flash-Au金属化层之间的界面由厚度接近80 nm的封闭晶体Au层组成。在该Au层上方,分析了由金属间相组成的第二个较小区域,并通过电子衍射将其识别为Au_8Al_3。此外,还确定了导线材料结构变化(纤维质地与重结晶晶粒)和粘结过程中超声功率之间的相关性。有了这个结果,对室温引线键合的理解可以大大提高。

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