Department of Microelectronics and Information Technology, KTH Royal Institute of Technology, Electrum 229, SE-16440 Kista-Stockholm, Sweden;
bipolar junction transistor; current gain; interface states; device simulation;
机译:界面状态对4H-SiC双极结型晶体管电流增益的影响的二维分析
机译:高电流增益4H-SiC双极结型晶体管
机译:4H-SIC双极晶体管的电流增益,包括界面状态的效果
机译:超高压4H-SiC双向绝缘栅双极晶体管。
机译:低关断损耗的4H-SiC沟槽绝缘栅双极晶体管的仿真研究
机译:500V,非常高的电流增益(β= 1517)4H-SiC Bipolar Darlington晶体管
机译:1570V,14a 4H-siC双极达林顿,具有Beta> 462的高电流增益