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MOCVD GROWTH OF InP/InGaAlAs DISTRIBUTED BRAGG REFLECTORS

机译:InP / InGaAlAs分布布拉格反射器的MOCVD生长

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摘要

Long wavelength vertical cavity surface emitting lasers (VCSELs) are considered to be the best candidate for the future low cost reliable light sources in fiber communications. However, the absence of high refractive index contrast in InP-lattice-matched materials impeded the development of 1.3-1.5 μm VCSELs. Although wafer fusions provided the alternative approaches to integrate the InP based gain materials with the GaAs/AlAs materials for their inherent high refractive index contrast, the monolithic InP-based latticed-matched distributed Bragg reflectors (DBRs) are still highly attractive. In this report, we demonstrate novel InP/InGaAlAs DBRs with larger refractive index contrast than InP/InGaAsP and InAlAs/InGaAlAs DBRs. The switching between InP and InGaAlAs layers and growth rate control have been done by careful growth interruption technique and accurate in situ optical monitoring in low pressure metal organic chemical vapor deposition. A 35 pairs 1.55 μm centered InP/InGaAlAs DBRs has the stopband of 95nm and the highest reflectivity of more than 99%. It should be applicable for 1.3-1.5 μm VCSELs devices.
机译:长波长垂直腔表面发射激光器(VCSEL)被认为是光纤通信中未来低成本可靠光源的最佳选择。然而,InP晶格匹配材料中缺乏高折射率对比,阻碍了1.3-1.5μmVCSEL的发展。尽管晶片融合提供了将基于InP的增益材料与GaAs / AlAs材料集成在一起的替代方法,以实现其固有的高折射率对比度,但基于InP的整体式网格匹配分布式布拉格反射器(DBR)仍然具有很高的吸引力。在此报告中,我们展示了比InP / InGaAsP和InAlAs / InGaAlAs DBR具有更大的折射率对比的新型InP / InGaAlAs DBR。 InP和InGaAlAs层之间的切换和生长速率控制是通过谨慎的生长中断技术和在低压金属有机化学气相沉积中进行精确的原位光学监控完成的。 35对1.55μm中心InP / InGaAlAs DBR具有95nm的阻带和最高99%以上的反射率。它应该适用于1.3-1.5μmVCSELs器件。

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