FABRICATION OF ELECTROCHROMIC DISPLAYS BY CHEMICALLY VAPOR DEPOSITING AND PATTERNING WO_3 FILMS ON SnO_2:F COVERED GLASS SUBSTRATES

摘要

Electrochromic displays were fabricated by chemically vapor depositing a tungsten film on SnO_2:F covered glass substrates with dimensions of 5X5 cm~2. Tungsten films were subsequently patterned by standard lithographic techniques and etched with a solution of tetra-methyl ammonium hydroxide. After patterning the tungsten films were oxidized to WO_3 in a furnace at 600℃ in various oxidizing ambients. Electrochromic displays were formed using another 5 x 5 cm~2 glass substrate as counter electrode. The two glass substrates were sealed together with a sealant and a 1M H_2SO_4 aqueous solution was used as ionic conductor. Response times of down to 0.27 sec were measured on these electrochromic displays.