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Effects of Laser Sources on the Reverse-Bias Leakages of Laser Lift-Off GaN- Based LEDS

机译:激光源对基于激光剥离的GaN基LEDS的反向偏置泄漏的影响

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摘要

The KrF pulsed excimer laser (248 nm) and the frequency-tripled Nd YAG laser (355nm) were used to separate GaN thin films from sapphire substrates. The effect of these two laser sources on the reverse-bias leakages of InGaN-GaN light-emitting diodes (LEDs) were studied.
机译:使用KrF脉冲准分子激光器(248 nm)和三倍频Nd YAG激光器(355nm)将GaN薄膜与蓝宝石衬底分离。研究了这两个激光源对InGaN-GaN发光二极管(LED)的反向偏置泄漏的影响。

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