首页> 外文会议>Diffusion in solids and liquids VI >Investigation of Grain Boundary Diffusion in Thin Films by SNMS Technique
【24h】

Investigation of Grain Boundary Diffusion in Thin Films by SNMS Technique

机译:SNMS技术研究薄膜中的晶界扩散

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

It was shown more recently in our Laboratory [1,2,3] that having a substrate/difrusant/thin-film/cap-layer structure (the thin film was typically several 10 nm thick, with the same order of magnitude of grain size; the refractory metal cap layer was used just to avoid the oxidation), first the diffusant atoms migrated very fast across the thin film and segregated at the film/cap-layer interface. The accumulated atoms at the film/cap layer interface form a secondary diffusion reservoir and atoms diffuse back to the layer. Later on, the thin film was gradually filled up with the diffusing atoms and composition depth profiles, determined by Secondary Neutral Mass Spectroscopy (SNMS), showed a maximum at the cap layer-thin film interface. The accumulated atoms at this interface formed a secondary diffusion reservoir and atoms diffused back to the layer. These observations can be interpreted supposing a bimodal grain boundary structure with different (fast and low) diffusivities. The observed grain boundary diffusion phenomena can be classified as C-type diffusion. The appearance of the peak observed at the cap layer interface can be used as a tool to determine the grain boundary diffusivity along the fast boundaries. Because the fast boundaries were saturated in the first stage of the process, this back-diffusion took place along the low-diffusivity boundaries only. Thus the SNMS depth-profiling is a good method to determine grain boundary diffusivities in a bimodal structure. In addition, from the overall impurity content inside the film the segregation can also be estimated, if the bulk solubility is low and the GB density is known. Numerical simulations of C-type GB diffusion in thin films with a bimodal structure confirmed that the interpretation of the result depicted above is reasonable [4]. In order to estimate roughly the GB diffusion data we determined the fast diffusivity using the first appearance method. The lower diffusivity was determined from the time evolution of the broadening of the diffusant/thin film interface. In addition both (slow and fast) diffusivities were also estimated from fitting numerical solutions obtained in [4] too.
机译:最近在我们的实验室[1,2,3]中显示具有基材/扩散剂/薄膜/盖层结构(薄膜通常为几10 nm厚,晶粒大小的数量级相同) ;使用耐火金属覆盖层只是为了避免氧化),首先,扩散原子非常快地迁移穿过整个薄膜,并在薄膜/覆盖层界面处隔离。在膜/盖层界面处累积的原子形成次级扩散库,原子扩散回该层。后来,薄膜被扩散原子逐渐填充,通过二次中性质谱(SNMS)确定的成分深度分布在盖层-薄膜界面处显示出最大值。在该界面处积累的原子形成了二级扩散储层,原子扩散回了该层。可以假设具有不同(快速和低)扩散率的双峰晶界结构来解释这些观察结果。观察到的晶界扩散现象可以归类为C型扩散。在覆盖层界面处观察到的峰的出现可用作确定沿着快速边界的晶界扩散率的工具。由于快速边界在过程的第一阶段已饱和,因此这种反向扩散仅沿低扩散率边界发生。因此,SNMS深度剖析是确定双峰结构中晶界扩散率的好方法。另外,如果整体溶解度低并且GB密度已知,则还可以从薄膜内部的总杂质含量估算偏析。具有双峰结构的薄膜中C型GB扩散的数值模拟证实了上述结果的解释是合理的[4]。为了大致估计GB扩散数据,我们使用第一种出现方法确定了快速扩散率。较低的扩散率是由扩散剂/薄膜界面扩展的时间演变确定的。另外,也通过[4]中获得的拟合数值解估计了(慢和快)扩散率。

著录项

  • 来源
    《Diffusion in solids and liquids VI》|2010年|p.1208-1215|共8页
  • 会议地点 Paris(FR);Paris(FR)
  • 作者单位

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    University of Debrecen, Department of Solid State Physics, H-4010 Debrecen P.O. Box 2. Hungary;

    Institute of Nuclear Research, Hungarian Academy of Sciences (ATOMKI), H-4001 Debrecen P.O. Box 51 Hungary;

    Institute of Nuclear Research, Hungarian Academy of Sciences (ATOMKI), H-4001 Debrecen P.O. Box 51 Hungary;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料一般性问题;
  • 关键词

    grain-boundary diffusion; grain-boundary segregation; thin films; secondary neutral mass spectroscopy;

    机译:晶界扩散晶界偏析;薄膜;二次中性质谱;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号