Interface Engineering Routes for a Future CMOS Ge-based Technology

摘要

We present an overview study of two germanium interface engineering routes, firstly a germanate formation via La2O_3 and Y_2O_3, and secondly a barrier layer approach using Al_2O_3 and Tm_2O_3. The interfacial composition, uniformity, thickness, band gap, crystallinity, absorption features and valence band offset are determined using X-ray photoelectron spectroscopy, ultra violet variable angle spectroscopic ellipsometry, and high resolution transmission electron microscopy. The correlation of these results with electrical characterization data make a case for Ge interface engineering with rare-earth inclusion as a viable route to achieve high performance Ge CMOS.