Investigation of Strong Metallic Ta Reduction in ZrO_2/Ta_2O_5 Multi-laminate Layer Growth

摘要

Thin ZrO_2/Ta_2O_5 multi-laminate layer of ～10 nm was grown by atomic layer deposition (ALD) method and it was discussed about the metallic Ta reduction at the interface between ZrO_2 and Ta_2O_5. Metallic Ta 4f_(7/2) peak was observed inside of the layer from the result of XPS analysis and it is thought that strong metallic Ta reduction was happened between Ta_2O_5 and as-coming Zr source (or ZrO_2). Also, these results were supported by the Gibbs free energy calculations.