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Electrical and optical properties of VO_2 thin films affected by preparation process

机译:制备过程对VO_2薄膜电学和光学性能的影响

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摘要

VO_2 thin films were prepared from V_2O_5 films using post-deposition annealing in vacuum. The films obtained have been studied by using XRD, XPS, SEM, UV-VIS and electrical measurements. The results show that the samples prepared at the optimal conditions before and after phase transition the resistance of VO_2 thin film changes about 10~3 orders and the transmittance of 900nm light change 40%. Different preparation conditions can change the phase transition properties in VO_2 thin films. The structural properties of samples are improved but the phase transition properties are declined by the increase of annealing time and annealing temperature. The best reasonable annealing time and annealing temperature has been got by discussing the effects of annealing time and annealing temperature on the phase transition point and hysteresis width. Other factors that affect the optical and electrical properties in VO_2 thin films have also been discussed.
机译:使用真空中的沉积后退火由V_2O_5薄膜制备VO_2薄膜。已经通过使用XRD,XPS,SEM,UV-VIS和电学测量研究了获得的膜。结果表明,在相变前后的最佳条件下制备的样品,VO_2薄膜的电阻变化约10〜3个数量级,900nm光的透射率变化40%。不同的制备条件可以改变VO_2薄膜的相变性能。样品的结构性能得到改善,但随着退火时间和退火温度的增加,相变性能下降。通过讨论退火时间和退火温度对相变点和磁滞宽度的影响,获得了最佳的合理退火时间和退火温度。还讨论了影响VO_2薄膜中光学和电学性质的其他因素。

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