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Layout Rule Trends and Affect upon CPU Design

机译：布局规则趋势及其对CPU设计的影响

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The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.

机译：描述了布局规则的趋势以及这些规则对设计的影响。分辨率的缓慢提高引起了对光刻友好设计的需求。显示了由LFD引起的问题以及规则数量和复杂性的增加。讨论了实现LFD的问题。

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来源
《Design and Process Integration for Microelectronic Manufacturing IV 》|2006年|P.615602.1-615602.9|共9页
会议地点 San JoseCA(US)
作者
Clair Webb;
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作者单位

Logic Technology Division, Intel Corporation;

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会议组织
原文格式 PDF
正文语种 eng
中图分类微电子学、集成电路（IC） ;
关键词
litho-friendly design(LFD); design rules trends; layout; circuit and process interaction; gridded layout;

机译：光刻友好设计（LFD）;设计规则趋势;布局;电路和过程交互;网格布局;

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4. Layout Rule Trends and Affect upon CPU Design [C] . Clair Webb, SPIE-The International Society for Optical Engineering Conference on Design and Process Integration for Microelectronic Manufacturing . 2006

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Layout Rule Trends and Affect upon CPU Design

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