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Scanning tunneling induced luminescence studies of GaAs(100) surfaces after different surface treatments

机译:不同表面处理后GaAs(100)表面的扫描隧道致发光研究

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摘要

We demonstrate the suitability of scanning tunneling induced luminescence (STIL) measurements for studying the influence of plasma induced surface damage on GaAs (100) surfaces with resolution in the nanometer range. The STIL experiments are compared with results obtained from C/V and I/V measurements at different etch depths which give information about the concentration and depth of crystal defects.
机译:我们证明了扫描隧道诱导发光(STIL)测量的适用性,用于研究等离子体诱导的表面损伤对GaAs(100)表面的影响,分辨率在纳米范围内。将STIL实验与在不同蚀刻深度下从C / V和I / V测量获得的结果进行比较,从而得出有关晶体缺陷浓度和深度的信息。

著录项

  • 来源
  • 会议地点 Santander(ES);Santander(ES)
  • 作者单位

    Institute for Microwave Electronics, TH Darmstadt, Merckstr. 25,64283 Darmstadt, Germany;

    Institute of Applied Physics, TH Darmstadt, Schlossgartenstr. 7,64289 Darmstadt, Germany;

    Institute of Applied Physics, TH Darmstadt, Schlossgartenstr. 7,64289 Darmstadt, Germany;

    Institute of Applied Physics, TH Darmstadt, Schlossgartenstr. 7,64289 Darmstadt, Germany;

    Institute for Microwave Electronics, TH Darmstadt, Merckstr. 25,64283 Darmstadt, Germany;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 硅酸盐工业;无机质材料;
  • 关键词

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