Department of Physics and Astronomy and W. M. Keck Foundation Free-electron Laser Center, Vanderbilt University, 6301 Stevenson Center, Nashville, TN USA 37235;
Department of Physics, Berea College, 2191 Campus Drive, Berea, KY USA 40404;
AppliFlex LLC, 32;
laser ablation; resonant infrared pulsed-laser deposition; thin-film deposition; free-electron lasers;
机译:衬底温度和激光注量对脉冲激光沉积ZnO薄膜性能的影响
机译:激光能量通量对Rayleigh-Taylor不稳定性的开始和生长的影响及其对脉冲激光沉积设备中生长的Fe薄膜形貌的影响
机译:激光能量通量对Rayleigh-Taylor不稳定性的开始和生长的影响及其对脉冲激光沉积设备中生长的Fe薄膜形貌的影响
机译:激光波长,流量和脉冲持续时间对导电聚合物红外脉冲激光沉积的影响
机译:钛和碳化硅的脉冲激光沉积中的激光脉冲持续时间和电场效应
机译:耳蜗脉冲980 nm短波长红外神经刺激和激光参数对听觉响应特征的影响
机译:激光波长和能量密度对脉冲激光沉积ZnO薄膜生长的影响