首页> 外文会议>Conference on Gallium Nitride Materials and Devices; 20080121-24; San Jose,CA(US) >On Chip Surge Protection for GaN Power LEDs by ZnO Thin Film Varistor
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On Chip Surge Protection for GaN Power LEDs by ZnO Thin Film Varistor

机译:ZnO薄膜压敏电阻对GaN大功率LED的片上浪涌保护

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High electrostatic discharge(ESD) endurance capability is an important issue for extensive applications of power light emitting diodes (LEDs). Conventional ceramic varistors, based on sintered bulk zinc oxide (ZnO), with various metal oxides as additives have been widely used in surge protection devices by grounding the excess current for a long time. Those sintered bulk ZnO devices are known to exhibit high nonlineariry coefficient (α□50) and good reliability for many commercial applications. However, the sintering manufacture method limits the practicability of integrating bulk ZnO varistor with other semiconductor devices. In this paper, we report on the thin-film ZnO produced by sputtering system and post-heat treatment which has shown good varistor characteristics. The nonlinear coefficients (a) in the corresponding current -voltage (I-V) curve can up to 50 at a high electric field of 1.1 kV/cm, With efficiently resolving thermal generated by high injected current, this thin film varistor can conduct current to the density as high as 20A/cm~2 successfully. In addition, we connected the ZnO varistor with GaN power LEDs by gold wire bonding. This structure revealed an improved electrostatic discharge (ESD) ability of up to 400V. This wire bonding configuration will be modified to a flip-chip LED with the ZnO/Si submount in the future. Sputtering and annealing are two commonly used processes in general semiconductor manufacturing procedures which are adopted in our ZnO thin film deposition. Therefore, our proposed method has provided a new possible solution to integrate not only LEDs but also other semiconductor devices with thin film varistor having surge protection capability, especially to accomplish an on-chip surge protection.
机译:对于电源发光二极管(LED)的广泛应用,高静电放电(ESD)耐受能力是一个重要的问题。基于烧结体氧化锌(ZnO),以各种金属氧化物作为添加剂的传统陶瓷压敏电阻通过长时间将多余电流接地,已广泛用于电涌保护器件中。众所周知,那些烧结的块状ZnO器件在许多商业应用中显示出高非线性系数(α□50)和良好的可靠性。然而,烧结制造方法限制了将块状ZnO压敏电阻与其他半导体器件集成的实用性。在本文中,我们报告了通过溅射系统和后热处理产生的薄膜ZnO,它们显示了良好的压敏电阻特性。在1.1 kV / cm的高电场下,相应电流-电压(IV)曲线中的非线性系数(a)可以高达50。通过有效地解决高注入电流产生的热,该薄膜压敏电阻可以将电流传导至密度成功达到20A / cm〜2。此外,我们通过金线键合将ZnO压敏电阻与GaN功率LED连接在一起。这种结构揭示了高达400V的改进的静电放电(ESD)能力。将来,这种引线键合配置将被修改为具有ZnO / Si底座的倒装芯片LED。溅射和退火是在我们的ZnO薄膜沉积中采用的一般半导体制造程序中两个常用的过程。因此,我们提出的方法提供了一种新的可能的解决方案,不仅可以集成LED,而且可以集成其他具有浪涌保护能力的薄膜压敏电阻的半导体器件,尤其是可以实现片上浪涌保护。

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