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GaN planar schottky barrier diode with cut-off frequency of 627 GHz

机译:截止频率为627 GHz的GaN平面肖特基势垒二极管

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GaN Schottky barrier diodes(SBD) have shown great potential for high temperature, high power and high frequency applications. This paper presents the design, fabrication and measurement of the GaN planar SBD using the air-birdge Technology and electroplating Technology to reduce the parasitic parameters. An ohmic contact resistance of 0.15 Ω·mm was obtained with a Ti/Al/Ni/Au metal stack which is about 40% lower than a Ti/Al/Ti/Au metal stack. Also, we found the chemical treatment of the N+ GaN surfaces employing HCl+HF was better than BOE. Devices with various anode diameters(3-7μm) were fabricated on the same chip. The fabricated GaN SBD diodes were characterized by I-V and C-V measurements at DC. On-wafer small-signal S-parameter measurements were also performed up to 50 GHz. A cut-off frequency (f
机译:GaN肖特基势垒二极管(SBD)在高温,高功率和高频应用中显示出巨大潜力。本文介绍了利用空气波导技术和电镀技术来降低寄生参数的GaN平面SBD的设计,制造和测量。 Ti / Al / Ni / Au金属叠层的欧姆接触电阻为0.15Ω·mm,比Ti / Al / Ti / Au金属叠层低约40%。此外,我们发现采用HCl + HF的N + GaN表面化学处理优于BOE。在同一芯片上制造了具有各种阳极直径(3-7μm)的器件。通过在直流下进行I-V和C-V测量来表征所制造的GaN SBD二极管。在高达50 GHz的频率下,还进行了晶圆上小信号S参数测量。截止频率(f

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