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Plasma-assisted molecular beam epitaxial growth and characterization of zincblende (InAlGa)N heterostructures on GaAs(001)

机译:GaAs(001)上等离子辅助分子束外延生长和闪锌矿(InAlGa)N异质结构的表征

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Abstract: We report on successful growth of zincblende ($beta@) (In,Al,Ga)N heterostructures on GaAs(001) by means of rf plasma assisted molecular beam epitaxy. The composition of the samples under investigation is analyzed by secondary ion mass spectroscopy and x-ray diffraction. Cross-sectional transmission electron microscopy is used for studying the microstructure and selected area diffraction for verifying the phase purity of the epilayers. The surface morphology is investigated by atomic force microscopy. Temperature dependent transmission, reflectance, and photoluminescence investigations allow the determination of the band gap energy of $beta@-In$-x$/Ga$-1$MIN@x$/N. It is shown that by using $beta@-In$-x$/Ga$-1$MIN@x$/N blue and green band-edge related emission is obtained with respectively, x $EQ 0.17 and x $EQ 0.4 in contrast to wurtzite In$-x$/Ga$-1$MIN@x$/N where In contents of about x $EQ 0.25 and x $EQ 0.55 are required for achieving the respective colors. !28
机译:摘要:我们报道了通过射频等离子体辅助分子束外延成功地在GaAs(001)上生长了闪锌矿($ beta @)(In,Al,Ga)N异质结构。通过二次离子质谱和x射线衍射分析所研究样品的组成。截面透射电子显微镜用于研究微观结构和选定区域的衍射,以验证外延层的相纯度。通过原子力显微镜研究表面形态。温度相关的透射率,反射率和光致发光研究允许确定$ beta @ -In $ -x $ / Ga $ -1 $ MIN @ x $ / N的带隙能量。结果表明,通过使用$ beta @ -In $ -x $ / Ga $ -1 $ MIN @ x $ / N,分别获得x和EQ 0.17和x $ EQ 0.4与纤锌矿In $ -x $ / Ga $ -1 $ MIN @ x $ / N形成对比,其中In的含量约为x $ EQ 0.25和x $ EQ 0.55,才能获得相应的颜色。 !28

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