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Thin Film Coating Analysis Using a Novel IR Camera and a Broadband Echelle Spectrograph

机译:使用新型红外摄像头和宽带埃歇尔光谱仪进行薄膜镀膜分析

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An echelle spectrograph can provide high resolving power (wavelength/FWHM) across a broad spectral range. These optical instruments are commonly used in spectroscopy for atomic and molecular identification in astronomical observations and laboratory analysis. The wavelength range of an echelle spectrograph is ultimately limited by the capabilities of the detector used to acquire the spectral data. Silicon based CCD, EMCCD and CMOS sensors typically enable measurements from 200nm to 1100nm. Infrared Laboratories and Catalina Scientific Instruments (CSI) have collaborated to demonstrate an application that combines IR Lab's TRIWAVE camera with CSI's EMU120/65 echelle spectrograph. The TRIWAVE camera covers a spectral range of 300nm to 1600nm, greatly increasing the wavelength range for applications using the EMU-120/65 spectrograph. With this increased capability, an opportunity exists for measuring the dielectric coating thickness of thin film by extracting and analyzing interference fringes from the spectral data. Methods and results of this measurement will be presented.
机译:阶梯质谱仪可以在较宽的光谱范围内提供较高的分辨能力(波长/ FWHM)。这些光学仪器通常用于光谱学中,用于天文观测和实验室分析中的原子和分子鉴定。阶梯光谱仪的波长范围最终受到用于采集光谱数据的检测器功能的限制。基于硅的CCD,EMCCD和CMOS传感器通常可实现200nm至1100nm的测量。红外实验室和Catalina科学仪器公司(CSI)合作演示了将IR Lab的TRIWAVE相机与CSI的EMU120 / 65阶梯质谱仪结合使用的应用程序。 TRIWAVE摄像机覆盖300nm至1600nm的光谱范围,极大地增加了使用EMU-120 / 65光谱仪的应用的波长范围。有了这种增加的能力,就有机会通过从光谱数据中提取和分析干涉条纹来测量薄膜的介电涂层厚度。将介绍此测量的方法和结果。

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