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Auger effect limited performance in tunnel field effect transistors

机译:俄歇效应限制了隧道场效应晶体管的性能

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Tunnel field-effect-transistors (TFETs) are promising candidates for next generation transistors for low power applications, as the TFETs promise low subthreshold swing (SS). Different from traditional MOSFET, the TFETs rely on energy-efficient switching of band-to-band tunneling (BTBT), therefore the SS in TFETs is not limited by the 60 mV/decade Boltzmann limit. This reduction in energy consumption makes TFETs suitable candidates to replace standard MOSFETs in low power applications. However, most experimentally demonstrated TFETs suffer from low on current[1], and the theoretical low SS is compromised by impurities and Auger generation. To understand the underlying physics and predict the device characteristics of TFETs, sophisticated numerical simulations can be used. On the other hand, physics based compact models are also required to provide fast predictions for existing and new device concepts. Furthermore, a physics based compact model is more efficient to model the effects like Auger generation which could be time-consuming for numerical calculations. In this work, we introduce a physics based compact model for homojunction TFETs with Auger generation effect considered. This compact model is based on the modified Simmons' equation at finite temperature[2]. With our compact model, the possible impact of Auger generation effect to off-current and SS is explored.
机译:隧道场效应晶体管(TFET)有望成为低功率应用的下一代晶体管的候选者,因为TFET承诺了低亚阈值摆幅(SS)。与传统的MOSFET不同,TFET依靠能效开关的带间隧道(BTBT),因此TFET中的SS不受60 mV /十倍玻尔兹曼极限的限制。能耗的减少使TFET成为替代低功率应用中标准MOSFET的合适选择。然而,大多数实验证明的TFET的导通电流很低[1],理论上的低SS受杂质和俄歇(Auger)产生的影响。为了了解底层物理原理并预测TFET的器件特性,可以使用复杂的数值模拟。另一方面,还需要基于物理学的紧凑模型来提供对现有和新设备概念的快速预测。此外,基于物理学的紧凑模型更有效地建模了诸如俄歇(Auger)生成之类的效果,这对于数值计算可能是耗时的。在这项工作中,我们介绍了考虑了俄歇效应的同质结TFET的基于物理的紧凑模型。这个紧凑的模型基于有限温度下的改良西蒙斯方程[2]。利用我们的紧凑模型,探索了俄歇产生效应对电流和SS的可能影响。

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