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INTEGRATED PIEZORESISTIVE FLEXURE MODEL IN POLYSILICON

机译:多晶硅集成抗压挠曲模型

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摘要

This paper presents a new model and test device for determining piezoresistive response in long, thin polysilicon beams with axial and bending moment inducing loads. If the piezoresistive coefficients are known, the Integrated Piezoresistive Flexure Model (IPFM) is used to find the new resistance of a beam under stress. The IPFM first discretizes the beam into small volumes represented by resistors. The stress that each of these volumes experiences is calculated, and the stress is used to change the resistance of the representative resistors according to a second-order piezoresistive equation. Once the resistance change in each resistor is calculated, they are combined in parallel and series to find the resistance change of the entire beam. If the piezoresitive coefficients are not initially known, data are first collected from a test device. Piezoresistive coefficients need to be estimated and the IPFM is run for the test device's different stress states giving resistance predictions. Optimization is done until changing the piezoresistive coefficients provides model predictions that accurately match experimental data. These piezoresistive coefficients can then be used to design and optimize other piezoresistive devices. A sensor is optimized using this method and is found to increase voltage response by an estimated 10 times.
机译:本文提出了一种新的模型和测试装置,用于确定细长的多晶硅梁中具有轴向和弯矩感应载荷的压阻响应。如果压阻系数已知,则使用集成压阻挠曲模型(IPFM)来查找梁在应力下的新电阻。 IPFM首先将光束离散为由电阻代表的小体积。计算这些体积中的每一个所承受的应力,并将该应力用于根据二阶压阻方程式来改变代表性电阻器的电阻。一旦计算出每个电阻器的电阻变化,就可以将它们并联和串联组合以找到整个射束的电阻变化。如果最初不知道压阻系数,则首先从测试设备中收集数据。需要估计压阻系数,并针对测试设备的不同应力状态运行IPFM,以提供电阻预测。进行优化直到更改压阻系数即可提供与实验数据精确匹配的模型预测。这些压阻系数随后可用于设计和优化其他压阻器件。使用此方法对传感器进行了优化,发现传感器的电压响应估计增加了10倍。

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