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Observations of piezoresistivity for polysilicon in bending that are unexplained by linear models

机译:线性模型无法解释的弯曲中多晶硅压阻性的观察

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Compliant piezoresistive MEMS sensors exhibit great promise for improved on-chip sensing. As compliant sensors may experience complex loads, their design and implementation require a greater understanding of the piezoresistive effect of polysilicon in bending and combined loads. This paper presents experimental results showing the piezoresistive effect for these complex loads. Several n-type polysilicon test structures, fabricated in MUMPs and SUMMiT processes, were tested. Results show that, while tensile stresses cause a linear decrease in resistance, bending stresses induce a nonlinear rise in resistance, contrary to the effect predicted by linear models. In addition, tensile, compresive, and bending loads combine in their effects on resistance. The experimental data illustrates the inability of linear piezoresistance models to predict the piezoresistive trends of polysilicon in bending and combined loads, indicating the need for more complete nonlinear models appropriate for these loading conditions. (c) 2007 Elsevier B.V. All rights reserved.
机译:符合标准的压阻MEMS传感器有望改善片上感测。由于顺应性传感器可能会承受复杂的载荷,因此其设计和实现需要对多晶硅在弯曲载荷和组合载荷中的压阻效应有更深入的了解。本文提供的实验结果显示了这些复杂负载的压阻效应。测试了以MUMP和SUMMiT工艺制造的几种n型多晶硅测试结构。结果表明,虽然拉应力导致电阻线性下降,但弯曲应力会导致电阻非线性上升,这与线性模型预测的结果相反。此外,拉伸,压缩和弯曲载荷共同影响了它们的阻力。实验数据表明,线性压阻模型无法预测弯曲和组合载荷下多晶硅的压阻趋势,这表明需要适用于这些载荷条件的更完整的非线性模型。 (c)2007 Elsevier B.V.保留所有权利。

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