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Thermionic Refrigeration Effect Based on Semiconductor Heterostructures

机译:基于半导体异质结构的热电子制冷效应

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As the number of transistors on LSIs increases, a new technology to remove the heat energydissipated from transistors and reduce the chip temperature is urgently required. We have fabricated anovel semiconductor heterostructure refrigeration device. This device utilizes both tunneling carrierinjection and thermionic emission, as proposed by Chao et al. [1]. The potential profile of this deviceis shown in Fig. 1; a quantum well (QW) is sandwiched by two asymmetric potential barriers. In thisstructure, low energy electrons are injected from the emitter (left electrode) into the quantum well byresonant tunneling through the first thin and high barrier. These electrons absorb heat in the QW andare thermionically emitted over the thicker and low barrier. This thick barrier also works as a wall toreduce the heat backflow [1]. In this system, the low-energy carrier injection and subsequentthermionic emission give rise to refrigeration in the QW.
机译:随着LSI上晶体管数量的增加,迫切需要一种新技术来消除晶体管上散发的热量并降低芯片温度。我们已经制造出阳极合金异质结构制冷装置。如Chao等人的建议,该装置同时利用了隧穿载流子注入和热电子发射。 [1]。该设备的电位曲线如图1所示。量子阱(QW)被两个不对称的势垒夹在中间。在这种结构中,低能电子通过共振隧穿穿过第一薄高屏障,从发射极(左电极)注入量子阱。这些电子在QW中吸收热量,并通过热电子方式在较厚且较低的势垒上方发射。这种厚厚的屏障还可以用作减少热量回流的墙[1]。在该系统中,低能载流子注入和随后的热电子发射引起了量子阱中的制冷。

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