首页> 外文会议>Applied Optical Metrology II >Dimensional metrology of micro structure based on modulation depth in scanning broadband light interferometry
【24h】

Dimensional metrology of micro structure based on modulation depth in scanning broadband light interferometry

机译:扫描宽带光干涉法中基于调制深度的微结构尺寸度量

获取原文
获取原文并翻译 | 示例

摘要

Three-dimensional measurement and inspection is an area with growing needs and interests in many domains, such as integrated circuits (IC), medical cure, and chemistry. Among the methods, broadband light interferometry is widely utilized due to its large measurement range, noncontact and high precision. In this paper, we propose a spatial modulation depth-based method to retrieve the surface topography through analyzing the characteristics of both frequency and spatial domains in the interferogram. Due to the characteristics of spatial modulation depth, the technique could effectively suppress the negative influences caused by light fluctuations and external disturbance. Both theory and experiments are elaborated to confirm that the proposed method can greatly improve the measurement stability and sensitivity with high precision. This technique can achieve a superior robustness with the potential to be applied in online topography measurement.
机译:三维测量和检查是一个在许多领域(例如集成电路(IC),医学治疗和化学领域)日益增长的需求和兴趣的领域。在这些方法中,宽带光干涉术由于其测量范围大,非接触和高精度而被广泛使用。在本文中,我们提出了一种基于空间调制深度的方法,通过分析干涉图中频域和空间域的特征来检索表面形貌。由于空间调制深度的特性,该技术可以有效地抑制光起伏和外部干扰造成的负面影响。理论和实验均经过详尽的阐述,证实了该方法可以大大提高测量的稳定性和灵敏度。此技术可以实现卓越的鲁棒性,并有可能应用于在线地形测量中。

著录项

  • 来源
    《Applied Optical Metrology II 》|2017年|103730G.1-103730G.7|共7页
  • 会议地点 San Diego(US)
  • 作者单位

    State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China,'University of Chinese Academy of Sciences, Beijing 100049, China;

    State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

    State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China,'University of Chinese Academy of Sciences, Beijing 100049, China;

    State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

    State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Micro structure; dimensional metrology; modulation depth; measurement stability;

    机译:微观结构;尺寸计量调制深度测量稳定性;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号