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Laser Processing Transparent Materials with Nanosecond, Picosecond and Femtosecond pulses for Industrial Applications

机译:激光加工具有纳秒,皮秒和飞秒脉冲的透明材料,用于工业应用

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In this paper, the micro-processing of glass, sapphire, and polymers using industrial-grade nanosecond (ns), picosecond (ps), and femtosecond (fs) lasers was reported. Square/round inner contour were fabricated in glass and sapphire (0.3 to 1.1 mm in thickness) by the ablation-based cutting method using the ns, ps and fs lasers. The chipping sizes were 20 -50um with 532nm ns laser, < 10 with 1064nm ps laser, and < 5 um with 515nm fs laser, respectively. When processed using the 532nm ns laser, the laser fluence is 5 - 10 times higher than that used in the ultrafast lasers. Outline-dicing of glass, and sapphire was conducted using a 1064 nm ps laser followed by thermal/mechanical breaking. The laser beam was shaped to form a long focal depth. Clean edges and cross-sections were observed on the processed transparent materials. Melting-free cutting of PI, and PLLA was successfully realized using a 515nm fs laser to fabricate printable electronic and medical devices. The impact of the key parameters, including pulse energy, repetition rate, focal spot size, beam shaping was systematically studied. The best ablation efficiencies of glass and sapphire obtained were 0.3 -0.4mm~3/(W · min.) when using the ultrafast lasers, which is much lower than that of polymers (2.0 - 4.0mm~3/(W.min).).
机译:本文报道了使用工业级纳秒(ns),皮秒(ps)和飞秒(fs)激光器对玻璃,蓝宝石和聚合物进行微处理的报道。通过使用ns,ps和fs激光的基于烧蚀的切割方法,在玻璃和蓝宝石(厚度为0.3到1.1毫米)中制造方形/圆形内部轮廓。芯片尺寸在532nm ns激光下为20 -50um,在1064nm ps激光下为<10 um,在515nm fs激光下为<5 um。当使用532nm ns激光器进行处理时,激光通量比超快激光器高5到10倍。使用1064 nm ps激光对玻璃和蓝宝石进行轮廓切割,然后进行热/机械破碎。激光束被成形以形成长焦深。在加工过的透明材料上观察到干净的边缘和横截面。使用515nm fs激光成功地实现了PI和PLLA的无熔化切割,以制造可印刷的电子和医疗设备。系统地研究了关键参数的影响,包括脉冲能量,重复频率,焦斑大小,光束整形。使用超快激光时,获得的最佳玻璃和蓝宝石烧蚀效率为0.3 -0.4mm〜3 /(W·min。),远低于聚合物的2.0-4.0mm〜3 /(W.min)。 )。

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