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Electroless Deposition of Bright/Black Pure Nickel Films from Simple SolutionConsists of Nickel Acetate and Hydrazine

机译：通过简单的溶液化学沉积亮/黑纯镍膜包括乙酸镍和肼

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《AESF SUR/FIN 2004 amp; interfinish 2004 world congress》|2004年|p.142-149|共8页
会议地点 Chicago IL(US);Chicago IL(US)
作者
S. Yae; K. Ito; T. Hamada; N. Fukumuro; H. Matsuda;
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原文格式 PDF
正文语种 eng
中图分类电镀工业;
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专利

1. Electroless Deposition of Pure Nickel Films form a Simple Solution Consisting of Nickel Acetate and Hydrazine [J] . S. Yae, K. Ito, T. Hamada Plating & Surface Finishing . 2005,第4期

机译：纯镍膜的化学沉积形成了一种由乙酸镍和肼组成的简单溶液
2. Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)-nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method [J] . Akhtar Masood, Revaprasadu Neerish, Malik Mohammad Azad, Materials science in semiconductor processing . 2015,第Null期

机译：气溶胶辅助化学气相沉积（AACVD）法从双（O-烷基黄原）-镍（II）配合物中沉积相纯硫化镍薄膜
3. Voltammetric behaviour and electrocatalytic activity of the aluminum electrode modified with nickel and nickel hexacyanoferrate films, prepared by electroless deposition [J] . M. H. Pournaghi-Azar, H. Razmi-Nerbin Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry . 1998,第1a2期

机译：化学沉积法制备的镍和六氰合铁氰酸镍薄膜修饰的铝电极的伏安行为和电催化活性
4. Electroless Deposition of Bright/Black Pure Nickel Films from Simple Solution Consists of Nickel Acetate and Hydrazine [C] . S. Yae, K. Ito, T. Hamada, Annual International Technical Conference . 2004

机译：来自简单溶液的明亮/黑色纯镍膜的无电沉积由醋酸镍和肼组成
5. Atomic Layer Deposition and Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Conversion to Nickel Silicide Films. [D] . Li, Zhefeng. 2011

机译：氮化镍膜的原子层沉积和直接液化化学气相沉积及其转化为硅化镍膜。
6. Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells [O] . Shu Huei Hsieh, Jhong Min Hsieh, Wen Jauh Chen, 2017

机译：用于硅太阳能电池正面金属化的化学镍沉积
7. Erratum to : Improvement on Brightness of Electroless Nickel Deposits Using Hydrazine as Reducing Agent [O] . 2001

机译：错误：使用肼作为还原剂的化学镀镍沉积物的改善
8. The Electrochemistry of Nickel:Ⅰ. Codeposition of Nickel and Hydrogen from Simple Aqueous Solutions [R] . John Yeager, J. P. Cels, Ernest Yeager 1958

机译：镍的电化学：Ⅰ。简单水溶液中镍和氢的共沉积

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