Electroless Deposition of Bright/Black Pure Nickel Films from Simple Solution Consists of Nickel Acetate and Hydrazine

摘要

We developed an autocatalytic plating solution for pure nickel deposits using hydrazine as a reducing agent. The solution is characterized by its extended lifetime, high deposition rate and high luster of deposits. In this study, it is found that a simple solution consists of nickel acetate and hydrazine that can deposit black nickel films stably. The deposition rate is 0.75 nm/s. The addition of a small amount of formaldehyde to the plating solution gives bright nickel films. The purity of the deposited nickel is higher than 99.7%. Its electric conductivity increases with the purity. The microstructure of the deposits was observed using a transmission electron microscope.