Engineering optical constants for broadband single layer antireflection coatings

摘要

We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si_(0.52)C_(0.16)N_(0.29), deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at A = 285 nm from 58% to 0.3%, corresponding to a factor of 195.