Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Institute of Plasma Physics, AS CR, v.v.i., Za Slovankou 1782/3, 182 00 Praha 8, Czech Republic;
Extreme ultraviolet interferometer; aspheric interferometer mirrors; multilayer reflection coating for 46.9 run; Ar~(8+) laser application; Ne-like Ar laser application;
机译:适用于极紫外干扰光刻的级联光栅干涉仪的设计注意事项
机译:探索正性化学放大抗蚀剂的极限分辨率:使用极端紫外线干涉光刻技术的26 nm密集线
机译:使用极端紫外线干涉光刻的高分辨率灰度图案化
机译:使用极端紫外线干涉光刻技术的超致密硅纳米线
机译:强烈的毛细管放电等离子体极紫外光源,用于极紫外光刻和其他极紫外成像应用。
机译:用于紫外检测的ZnO复合石墨烯涂层微纤维干涉仪
机译:探索模拟放大抗蚀剂的极限分辨率:使用极端紫外线光刻的26nm致密线
机译:mach-Zehnder干涉仪和多线HF激光器产生的干涉图案