Limitations of Analysis of Metal Impurities Analysis in High-k Film

机译：高k膜中金属杂质分析的局限性

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This work studies the efficiency of various approaches, using such instruments as total reflection X-ray fluorescence (TXRF), atomic absorption spectrometry (AAS) and inductively coupled plasma mass spectrometry (ICP-MS). The target metals are sodium (Na)

机译：这项工作使用诸如全反射X射线荧光（TXRF），原子吸收光谱（AAS）和感应耦合等离子体质谱（ICP-MS）之类的仪器研究了各种方法的效率。目标金属为钠（Na）

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来源
《Advanced Semiconductor Manufacturing Conference, 2007 IEEE/SEMI》|2007年|P.268-270|共3页
会议地点 StresaItaly
作者
Ya-Ling Po; Lin; C.; Shian-Shio Chen; Tings Wang;
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X-ray emission spectra; aluminium; calcium; chromium; copper; fluorescence; hafnium; hafnium compounds; high-k dielectric thin films; impurity absorption spectra; iron; mass spectra; nickel; sodium; zinc; HfO; :Al; HfO; :Ca; HfO; :Cr; HfO;

机译：X射线发射光谱；铝;钙;铬;铜;荧光铪; compounds化合物;高介电常数薄膜杂质吸收光谱铁;质谱;镍;钠;锌HfO;：Al; HfO;：Ca; HfO;：Cr; f;

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2. Precise impurity analysis of Cu films by GDMS: relation between negative substrate bias voltage and impurity ionization potentials [J] . J.W. LIM, K. MIMURA, M. ISSHIKI Applied Physics. A, Materials Science & Processing . 2005,第5期

机译：GDMS对铜膜进行精确杂质分析：负衬底偏置电压与杂质电离势之间的关系
3. Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry: Concentration Change of Impurities by Applying Negative Substrate Bias Voltage [J] . Jae-Won Lim, Kouji Mimura, Minoru Isshiki Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第12期

机译：使用辉光放电质谱法分析Ta膜中的痕量杂质：通过施加负衬底偏置电压来杂质浓度变化
4. Limitations of Analysis of Metal Impurities Analysis in High-k Film [C] . Po, Ya-Ling, Lin, . 2007

机译：高k膜中金属杂质分析的局限性
5. Investigation of sample introduction for the inductively coupled plasma mass spectrometric analysis of nonmetal analytes in pharmaceutical compounds and impurities. [D] . Dill, Adam Elliott. 2009

机译：用于药物化合物和杂质中非金属分析物的电感耦合等离子体质谱分析的样品引入研究。
6. H-aggregate analysis of P3HT thin films-Capability and limitation of photoluminescenceand UV/Vis spectroscopy [O] . Philipp Ehrenreich, Susanne T. Birkhold, Eugen Zimmermann, -1

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7. High Reliable Quantification Analysis of Impurities in high-k Gate Dielectrics by SIMS [O] . Takahiro HASEGAWA, Seishi AKAHORI 2007

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8. Spectroscopic Analysis of Impurity Precipitates in CdS Films [R] . 1999

机译：Cds薄膜中杂质沉淀物的光谱分析

Limitations of Analysis of Metal Impurities Analysis in High-k Film

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