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Large-aperture continuous-phase diffractive optical element for beam transform

机译:用于光束变换的大孔径连续相衍射光学元件

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Abstract: Beam transform, such as to obtain uniform focal spot with flat top, steep edge, low side lobes and high light efficiency, can be realized well by diffractive optical element (DOE). The DOE has many advantages, such as high light efficiency and strong phase distribution design flexibility. To increase the light efficiency and decrease large-angle scattering, continuous phase DOE should be used. The phase design is competed by a kind of multi-resolution hybrid algorithm based on hill-climbing and simulated annealing, which exploits sufficiently strong convergence ability of the hill climbing and global optimization potential of the simulated annealing. A kind of phase distribution with good geometrical structure and diameter 80 mm is obtained by choosing disturbance function, receipt and refused probability and so on. The simulated results show that the light efficiency is more than 95 percent, and the non-uniformity is less than 5 percent. Because the etching depth is direct proportion to the exposure time, to obtain continuous phase DOE, a kind of hollowed-out mask, namely gray-scale mask is used to control exposure time of each are. The mask is manufactured by linear cutting machine. The continuous phase DOE with diameter 80mm is fabricated by ion-etching with the mask. Finally, the tolerance of manufacturing error including depth error and alignment error are analyzed. !7
机译:摘要:衍射光学元件(DOE)可以很好地实现光束变换,以获得平坦的顶部,陡峭的边缘,低旁瓣和高光效率的均匀焦点。 DOE具有许多优点,例如光效率高和强大的相分布设计灵活性。为了提高光效率并减少大角度散射,应使用连续相DOE。该相设计是通过一种基于爬坡和模拟退火的多分辨率混合算法进行竞争的,该算法充分利用了爬坡的收敛能力和模拟退火的全局优化潜力。通过选择扰动函数,接收和拒绝概率等方法,可以得到一种几何结构良好,直径为80 mm的相位分布。仿真结果表明,光效率大于95%,不均匀度小于5%。由于蚀刻深度与曝光时间成正比,因此为了获得连续相DOE,使用一种镂空的掩模,即灰度掩模来控制每个掩模的曝光时间。口罩由线性切割机制造。直径80mm的连续相DOE是通过用掩模进行离子蚀刻而制成的。最后,分析了包括深度误差和对准误差在内的制造误差公差。 !7

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