Rapid prototyping of coupled photonic cavities by focused ion beam/photolithography hybrid technique

摘要

Hybrid photolithography and focused ion beam (FIB) patterning of coupled photonic cavities is reported. This technique is used for rapid prototyping of nanophotonic devices, where previously mass-produced devices by conventional lithography steps, such as photolithography, projection lithography or nano/micro-imprinting can be customized by a versatile approach on a focused ion beam microscope. This requires accurate positioning of the FIB pattern relative to the pre-patterned devices and minimal drift during the writing phase. Various fabrication parameters that mimic process variability can be studied and the obtained experimental results compared with numerical simulations of the fabricated devices. This allows the calibration of the simulation models for more accurate design to manufacturing predictability. As a proof of concept, the experimental optimization of the localized modes in a photonic molecule formed by placing two one-dimensional photonic crystal cavities on a nanowire coupler is reported. The effects of different photonic crystal geometry, material removal depth and rate, sidewall profile and roughness, patterning drift on the performance of the photonic molecule resonator are investigated. These fabricated photonic molecule devices can be used as refractive index sensors with measured sensitivities on the order of 400 nm/RIU with a sensing volume as low as 18 femtoliters. The dimensions of the fabricated devices and the understanding of their optical behavior on environmental influence open the door for near-field optical spectroscopy of single bacterial specimens.