首页> 外文会议>4th European Conference on Silicon Carbide and Related Materials (ECSCRM 2002); Sep 2-5, 2002; Linkoeping, Sweden >Investigation of Defects in 4H-SiC by Synchrotron Topography, Raman Spectroscopy Imaging and Photoluminescence Spectroscopy Imaging
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Investigation of Defects in 4H-SiC by Synchrotron Topography, Raman Spectroscopy Imaging and Photoluminescence Spectroscopy Imaging

机译:同步辐射形貌,拉曼光谱成像和光致发光光谱成像研究4H-SiC中的缺陷

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摘要

Reflection synchrotron topography, integrated photoluminescence imaging and Raman spectroscopy imaging have been performed on a 4H-SiC slice. The three methods give complementary information on the defects in the crystal. The differences between the observations are discussed.
机译:在4H-SiC切片上进行了反射同步加速器形貌,集成的光致发光成像和拉曼光谱成像。三种方法可提供有关晶体缺陷的补充信息。讨论了意见之间的差异。

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