首页> 外文会议>43rd Society of Vacuum Coaters(SVC) Annual Technical Conference Apr 15-20, 2000, Denver, Colorado >Applying Combinatorial Chemistry Methodology to Optimizing the Growth of Indium Tin Oxide on Polymeric Substrates
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Applying Combinatorial Chemistry Methodology to Optimizing the Growth of Indium Tin Oxide on Polymeric Substrates

机译:应用组合化学方法优化聚合物基底上铟锡氧化物的生长

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Deposition conditions yielding good indium tin oxide (ITO) films on glass, with transmission > 85% and resistance < 15 Ohms/square, led to ITO films on plastic with cracks, decreased transmission, and increased resistance. By systematically changing key growth conditions during the deposition of ITO on large polymeric substrates, libraries of films were grown. The transmittance and resistance of the thin film libraries were characterized and the results correlated to the instantaneous growth conditions for the particular films. This combinatorial approach to optimizing the growth of ITO on a different substrate substantially decreased the number of experiments, and consequently the total time, necessary to determine the appropriate deposition conditions for the new substrate.
机译:沉积条件在玻璃上产生良好的铟锡氧化物(ITO)膜,其透射率> 85%,电阻<15 Ohms / square,导致在塑料上的ITO膜出现裂纹,透射率降低,电阻增加。通过在大型聚合物基材上沉积ITO期间系统地改变关键的生长条件,可以生长膜库。表征了薄膜库的透射率和电阻,并且结果与特定膜的瞬时生长条件相关。这种优化ITO在不同基板上生长的组合方法大大减少了实验次数,因此减少了确定新基板合适的沉积条件所需的总时间。

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