Electrodeposition of Poly(phenylene oxide) Nanoscale Patterns with Nanosphere Lithography

摘要

Nanosphere lithography is used to generate a poly(phenylene oxide) (PPO) nanowell nanopattern. The thickness of the PPO film increased with increasing the scan cycle number and the monomer concentration and reached the maximum thickness of a bout 20 nm. The size and pitch of the nanowells can be adjusted by the size of the nanospheres used.