首页> 外文会议>21st International Conference on Defects in Semiconductors (ICDS-21) Jul 16-20, 2001 Giessen, Germany >Fermi-level dependence of formation of hydrogen molecules in crystalline silicon
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Fermi-level dependence of formation of hydrogen molecules in crystalline silicon

机译:硅中氢分子形成的费米能级依赖性

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摘要

We report a systematic investigation on the Fermi-level dependence of the formation of two different types of hydrogen molecules in silicon. Hydrogen molecule at the tetrahedral (T) site (H_2(T)) is formed only in heavily doped n-type below 200℃, but is observed both in the n- and p-type above 200℃. The temperature dependence is due to the increase of the thermally activated carrier concentration. The possible precursors of the H_2(T) are H~+ (BC) and H~0(BC) in the p-type, and H~-(T) and H~0 in the n-type. The Fermi level dependence of the formation of the hydrogen molecule trapped in platelets (H_2(p)) above 250℃ is very different from that below 250℃. The result suggests that platelets are formed from hydrogen-complexes other than the H_2~* above 250℃.
机译:我们报告了对硅中两种不同类型氢分子形成的费米能级依赖性的系统研究。在四面体(T)处的氢分子(H_2(T))仅在200℃以下重掺杂的n型中形成,而在200℃以上的n型和p型中均观察到。温度依赖性是由于热活化载流子浓度的增加。 H_2(T)的可能前体是p型的H〜+(BC)和H〜0(BC),n型的H〜-(T)和H〜0。 250℃以上的血小板(H_2(p))中捕获的氢分子的形成与费米能级的依赖性与250℃以下的非常不同。结果表明,血小板是由高于250℃的H_2〜*以外的氢络合物形成的。

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