首页> 外文会议>21st International Conference on Defects in Semiconductors (ICDS-21) Jul 16-20, 2001 Giessen, Germany >Defects agglomeration in the vicinity of hydrogen-related vacancy-type complexes in proton-implanted silicon
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Defects agglomeration in the vicinity of hydrogen-related vacancy-type complexes in proton-implanted silicon

机译:质子注入硅中氢相关的空位型配合物附近的聚集现象

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The results of IR studies of H interactions with radiation-induced defects in crystalline Si implanted with protons (Si:H) are presented. Wide doublets at ~1980, 2060 and ~720, 620cm~(-1) with relatively low thermal stability (the doublets are fully annealed at 550 K) appear in IR absorption spectra of Si: H when implantation dose is increased. It is shown that the doublets may be assigned to nuclei of two hydrogenated amorphous phases with different densities.The Si: H stretching spectra of as-implanted samples are greatly simplified with the increasing implantation dose. Four groups of IR bands predominate at high implantation doses: 2222 cm~(-1)―VH_4 2072 cm~(-1)―V_2H_2; the doublet at 2166, 2191cm~(-1)―V_2H_6; 1967cm~(-1)―an interstitial-type complex and the doublet at 2107, 2122cm~(-1)―a vacancy-type complex. It is shown that the doublet at 2107, 2122cm~(-1) may be tentatively assigned to V_6H_(12) which can serve as nuclei or precursors of the {111} platelets.
机译:提出了红外与质子(Si:H)注入的晶体硅中的H相互作用与辐射诱导的缺陷的红外研究结果。注入剂量增加时,Si:H的IR吸收光谱中出现了在〜1980、2060和〜720、620cm〜(-1)处较宽的双峰,热稳定性相对较低(双峰在550 K下完全退火)。结果表明,二重峰可以归属于密度不同的两个氢化非晶相的核。随着注入剂量的增加,注入样品的Si:H拉伸光谱得到了极大的简化。在高注入剂量下,四组红外波段占主导:2222 cm〜(-1)〜VH_4 2072 cm〜(-1)〜V_2H_2;在2166,2191cm〜(-1)―V_2H_6处的双峰; 1967cm〜(-1)为间隙型复合物,2107、2122cm〜(-1)处的双峰为空位复合物。结果表明,在2107、2122cm〜(-1)处的双峰可能被暂时分配给V_6H_(12),后者可作为{111}血小板的核或前体。

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