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Novel RRAM CMOS Non-Volatile Memory Cells in 130nm Technology

机译:采用130nm技术的新型RRAM CMOS非易失性存储单元

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The scaling projection of RRAM requires a point by point comprehension of switching operations and the effect of the devices sizes on the reliability of the mechanism. RRAM compatibility with CMOS allows the innovation of novel structures benefiting from both technologies' characteristics. This paper presents a detailed overview on RRAM characteristics, with deep looking on the reliability over numerous cycles. After reviewing the switching processes, the IT-IR architecture will be explored, specifically in the field of programmable memory cells making RRAM a strong competitor among future memory solutions. 8TIR structure is proposed as a hybrid structure that improve the performance providing a latching mechanism and better access over the cell.
机译:RRAM的缩放投影需要对开关操作以及器件尺寸对机构可靠性的影响进行逐点理解。 RRAM与CMOS的兼容性允许创新的结构受益于这两种技术的特性。本文提供了有关RRAM特性的详细概述,并深入研究了多个周期的可靠性。在审查了转换过程之后,将探索IT-IR体系结构,特别是在可编程存储单元领域,这将使RRAM成为未来存储解决方案中的强大竞争者。提出将8TIR结构作为一种混合结构,以提高性能,提供闩锁机制并更好地访问单元。

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