首页> 外文会议>2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon >Effect of independently sized gates on the delay of reconfigurable silicon nanowire transistor based circuits
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Effect of independently sized gates on the delay of reconfigurable silicon nanowire transistor based circuits

机译:独立大小的门对可重构硅纳米线晶体管电路延迟的影响

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Reconfigurable silicon nanowire field effect transistors (RFETs) provide both operation modes of p-type and n-type field effect transistors in a single multigate device. This unique feature provides additional degrees of freedom in terms of circuit design and device layout. Here a device-circuit co-design study of a novel 1-bit full adder with only 20 transistors is presented. The delay of the adder is analyzed using the logical effort theory and compared to standard CMOS implementation. The effect of independent gate sizing on device and circuit characteristics will be discussed. It will be shown that asymmetric gates can be exploited to reduce the critical delay of the new adder by 15 %, although the individual device performance is kept constant.
机译:可重构的硅纳米线场效应晶体管(RFET)在单个多栅极器件中提供p型和n型场效应晶体管的工作模式。此独特功能在电路设计和器件布局方面提供了额外的自由度。这里介绍了一种只有20个晶体管的新型1位全加法器的器件-电路协同设计研究。使用逻辑努力理论分析加法器的延迟,并将其与标准CMOS实现进行比较。将讨论独立栅极尺寸对器件和电路特性的影响。结果表明,尽管各个器件的性能保持恒定,但可以利用非对称门将新加法器的临界延迟降低15%。

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