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Challenges and opportunities for Fan-out Panel Level Packing (FOPLP)

机译:扇出面板级包装(FOPLP)的挑战和机遇

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摘要

Fan-out Wafer Level Packaging (FOWLP) is one of the latest packaging trends in microelectronics. Mold embedding for this technology is currently done on wafer level up to 12”/300 mm size. For higher productivity and therewith lower costs larger mold embedding form factors are forecasted for the near future. Following the wafer level approach then the next step will be a reconfigured wafer size of 450 mm. An alternative option would be leaving the wafer shape and moving to panel sizes leading to Fan-out Panel Level Packaging (FOPLP). Sizes for the panel could range up to 18”×24” or even larger. For reconfigured mold embedding, compression mold processes are used in combination with liquid, granular or sheet compound. As an alternative process, lamination can be also considered. Already today PCB technologies offer the potential for large area panel packaging up to 24”×18”/610 × 457 mm and can be applied to form a redistribution layer [RDL] for large area reconfigured wafers or panels, replacing thin film redistribution. For PCB based RDLs a resin coated copper sheet (RCC) is laminated on the reconfigured wafer or panel, respectively. Micro vias are drilled through the RCC layer to the die pads and electrically connected by Cu plating. Final process step is the etching of Cu lines using LDI techniques for maskless patterning. State of the art equipment and materials the manufacturing of structures down to 20 μm lines and spaces with a clear development trend to 10 μm lines and spaces and hence getting close to photolithography thin film structure sizes. Using the above mentioned maskless laser direct imaging technologies (LDI) instead of photolithography have a high potential for further cost reduction with intrinsic process advantages. The LDI cost advantage is backed by LDI availability for large panel sizes, also including 450 mm wafer form factors. Based on the technology - escribed the Fan-out Panel Level Packaging approach will be demonstrated on full 24”×18”/610 × 457 mm format including large area assembly, embedding and redistribution. Related technology challenges as die shift, warpage, panel handling or yield will be discussed in detail. Using maskless LDI technology real die positions could be automatically adapted to the redistribution and hence less accurate die placement can be compensated and higher die shift could be tolerated which is a big advantage when moving towards large area with acceptable yield. In summary this paper describes the technological path from wafer level embedding to 24”×18” fan-out panel level packaging technology in combination with low cost PCB based RDL processes and discusses challenges and opportunities in detail. The technology described offers a cost effective packaging solution for various application as packages for handheld consumer application or bio-medical application as sensor integration into microfluidics.
机译:扇出晶圆级封装(FOWLP)是微电子领域的最新封装趋势之一。目前,这项技术的模具嵌入是在最大12英寸/ 300毫米尺寸的晶圆上完成的。为了提高生产率并降低成本,预计在不久的将来会有更大的模具嵌入形状因数。遵循晶圆级方法,下一步将是重新配置尺寸为450毫米的晶圆。另一种选择是保留晶片形状并移至面板尺寸,从而形成扇出面板级封装(FOPLP)。面板的尺寸范围可以达到18“×24”,甚至更大。对于重新配置的模具嵌入,压缩模具工艺与液体,颗粒或片状化合物结合使用。作为替代方法,也可以考虑层压。如今,PCB技术已经为大面积面板封装提供了潜力,最大封装尺寸为24”×18” / 610×457 mm,可用于形成大面积重新配置的晶片或面板的重分布层[RDL],从而代替薄膜重分布。对于基于PCB的RDL,将树脂涂覆的铜片(RCC)分别层压在重新配置的晶片或面板上。在RCC层上钻微孔至芯片焊盘,并通过镀铜进行电连接。最终工艺步骤是使用LDI技术蚀刻铜线以进行无掩模图案化。使用最先进的设备和材料制造的结构,尺寸低至20μm的线和间距,并有明显的发展趋势,达到10μm的线和间距,因此接近于光刻薄膜结构尺寸。使用上述无掩膜激光直接成像技术(LDI)代替光刻技术具有很大的潜力,具有固有的工艺优势,可以进一步降低成本。 LDI的成本优势得到LDI在大型面板尺寸(包括450 mm晶圆尺寸)方面的可用性的支持。基于该技术-所描述的扇出面板级封装方法将在完整的24”×18” / 610×457 mm格式上进行演示,包括大面积组装,嵌入和重新分配。将会详细讨论诸如模头移位,翘曲,面板处理或成品率等相关技术挑战。使用无掩膜LDI技术,可以自动调整真实的芯片位置,以进行重新分配,因此可以补偿精度较低的芯片放置,可以容忍较高的芯片偏移,这在以可接受的良率向大面积移动时具有很大的优势。总之,本文描述了从晶圆级嵌入到24“×18”扇出面板级封装技术与基于PCB的低成本PCB RDL工艺相结合的技术路径,并详细讨论了挑战和机遇。所描述的技术提供了一种经济有效的包装解决方案,可用于各种应用,例如用于手持式消费类应用或生物医学应用的包装,以及集成到微流体中的传感器。

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