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Application of EMMI contrast method in failure analysis

机译:EMMI对比法在故障分析中的应用

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摘要

Photo emission microscope (EMMI) has been introduced in failure analysis of integrated circuits for a long time. By this technology, we can locate the failure site and confirm the failure mechanisms easily. However, there are considerable difficulties in determining test strategies and testability of fault localization when the circuit failed. In this paper, we proposed an EMMI contrast method in failure analysis of breakdown and current leakage. The contrast method mainly consists of I/V characteristic scan, quiescent bias testing and EMMI. Results indicate the method is efficient in ESD failure cases.
机译:长期以来,光发射显微镜(EMMI)一直被用于集成电路的故障分析。通过这种技术,我们可以定位故障部位并轻松确定故障机理。但是,在确定电路故障时的测试策略和故障定位的可测试性方面存在相当大的困难。在本文中,我们提出了一种EMMI对比方法来进行击穿和漏电流的故障分析。对比方法主要包括I / V特性扫描,静态偏差测试和EMMI。结果表明该方法在ESD故障情况下是有效的。

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