Opto-electrical properties of amorphous carbon thin films deposited by Aerosol-Assisted Chemical Vapor Deposition

摘要

Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm², 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>85%) and high absorption coefficient value (>10⁶ cm⁻¹) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.