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The preferential growth of #x03B7;-Cu6Sn5 on (111) uni-directional Cu pads

机译:(111)单向铜垫上η-Cu6Sn5的优先生长

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The uni-directional Cu with surface covered by (111) plane can be made by electroplating. The shape of Cu grain was columnar. The diameters of these columnar grains were 2 – 5 µm. After electroplating SnAg2.3 on the Cu pad and then reflowed at 260 oC, the ?-Cu6Sn5s have shown a preferential growth relationship on the uni-directional Cu. At the early stage of reflowing, the orientations of Cu6Sn5 were preferred at (0001). As the time of reflow extended, the orientations of Cu6Sn5 would change to be preferred at (2113). Since the uni-directional Cu was still poly-crystal metal, the coherence must be achieved by Cu-Sn bonding at the interface between Cu pads and the intermetallics. Electroplating parameters would affect the quality of uni-directional Cu and therefore affecting the preferential behavior of Cu6Sn5. With the technique of electroplating (111) uni-directional Cu, it is possible to control the orientations of intermetallics in the solder joints.
机译:其表面被(111)面覆盖的单向Cu可以通过电镀制成。 Cu晶粒的形状为圆柱状。这些柱状晶粒的直径为2 – 5 µm。在将SnAg2.3电镀到Cu垫上然后在260 oC回流之后,α-Cu 6 Sn 5 s在单向Cu上显示出优先生长关系。 。在回流的早期,Cu 6 Sn 5 的取向优选为(0001)。随着回流时间的延长,Cu 6 Sn 5 的方向将变为在(2113)处首选。由于单向Cu仍是多晶金属,因此必须通过在Cu焊盘和金属间化合物之间的界面处的Cu-Sn键实现相干性。电镀参数会影响单向Cu的质量,从而影响Cu 6 Sn 5 的优先行为。利用电镀(111)单向Cu的技术,可以控制焊点中金属间化合物的取向。

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