首页> 外文会议>2010 11th International Conference on Thermal, Mechanical amp; Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE) >Simulation-based analysis of the Heat-Affected Zone during target preparation by pulsed- laser ablation through stacked silicon dies in 3D integrated System-in-Packages
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Simulation-based analysis of the Heat-Affected Zone during target preparation by pulsed- laser ablation through stacked silicon dies in 3D integrated System-in-Packages

机译:通过3D集成式系统级封装中的堆叠硅芯片通过脉冲激光烧蚀在靶材制备过程中对热影响区进行基于仿真的分析

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摘要

The trends of 3D integration and System-in-Package (SiP) require the adaptation of target preparation methods for failure analysis of these complex integrated devices. Recent improvements in laser-based target preparation make laser cross-sections through several stacked silicon dies possible with remarkably small visible Heat-Affected Zones (HAZs). The distinct removal of Molding Compound (MC), silicon dies, and metal interconnects with a single laser source was demonstrated.
机译:3D集成和系统级封装(SiP)的趋势要求对这些复杂的集成设备进行故障分析的目标准备方法进行调整。基于激光的靶材制备的最新改进使得通过多个堆叠的硅芯片的激光截面成为可能,并且具有明显较小的可见热影响区(HAZ)。演示了使用单个激光源分别去除模塑料(MC),硅芯片和金属互连的情况。

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