1 J and 300 W XeCl-Excimer Laser with exceptional pulse stability for LTPS Annealing

摘要

TFT flat panel displays are rapidly increasing their share in the display market. Polycrystalline-silicon TFT technology is opening the door to highly reliable, high-resolution, high performance and large size Active Matrix Liquid Crystal Displays (AMLCD). For the formation of polycrystalline silicon, excimer laser annealing has shown itself to be superior to all other techniques as far as quality, reliability and economy is concerned. The remarkable progress in excimer laser technology over the last few years has resulted in a new annealing laser. The new excimer laser provides pulse energies of I J in combination with a exceptionally high pulse stability. Furthermore, Line Beam Optics systems for polycrystalline TFT annealing have been developed by MICROLAS (Gottingen, Germany) to obtain high quality and homogeneous annealing. This paper presents novel results for industrial excimer lasers generating 300 W average power and the line beam optics for high throughput polycrystalline silicon annealing.