FED Lithography Matching Approach

摘要

FED production requirements of a high-resolution critical layer, excellent layer-to-layer placement, and high throughput are all achieved by matching the characteristics of two photolithography g-line machines. The matching is achieved using an approach of characterizing and establishing as a standard grid the high-throughput 80 mm field lens machine. This is followed by a similar characterization and a match of the high-resolution 33 mm field lens machine to the standard grid.