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Fabrication and characterization of transparent conductive Sn-doped β-Ga_2O_3 single crystal

机译:掺Sn的透明导电β-Ga_2O_3单晶的制备与表征

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Transparent conductive Sn-doped β-Ga_2O_3 single crystal with high crystallinity was successfully fabricated as a substrate for the growth of GaN-based compounds. Sn-doped β-Ga_2O_3 single crystals were grown using a floating zone (FZ) method, and the properties of electrical conductivity, optical transmit-tance, and crystallinity were characterized to optimize the growth condition. It was found that these properties are controlled by the Sn doping concentration, and the specimen for 32 ppm Sn-doped β-Ga_2O_3 single crystal was optimized to satisfy these properties simultaneously, i.e. the substrate with the internal optical transmittance of above ~85 % in the visible region, the electrical resistivity of 4.27x10~(-2) Ωcm, the carrier density of 2.26x10~(18) cm~(-3), and the FWHM of X-ray rocking curve of 43 arcsec was obtained.
机译:成功地制备了具有高结晶度的透明导电掺Sn的β-Ga_2O_3单晶作为生长GaN基化合物的衬底。利用浮区法(FZ)生长了掺Sn的β-Ga_2O_3单晶,并通过表征其电导率,透光率和结晶度等特性优化了生长条件。结果表明,这些性质受Sn掺杂浓度的控制,并且对32 ppm Sn掺杂的β-Ga_2O_3单晶的样品进行了优化,以同时满足这些性质,即内部透光率在85%以上的衬底。在可见光区域,电阻率为4.27x10〜(-2)Ωcm,载流子密度为2.26x10〜(18)cm〜(-3),X射线摇摆曲线的FWHM为43 arcsec。

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